Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
Company codeACLS
Company nameAxcelis Technologies Inc
IPO dateJul 11, 2000
Founded at1995
CEODr. Russell J. Low, Ph.D.
Number of employees1524
Security typeOrdinary Share
Fiscal year-endJul 11
Address108 Cherry Hill Dr
CityBEVERLY
Stock exchangeNASDAQ Global Select Consolidated
CountryUnited States of America
Postal code01915
Phone19782324001
Websitehttps://www.axcelis.com/
Company codeACLS
IPO dateJul 11, 2000
Founded at1995
A total of
0.00
USD has been distributed in dividends over the past 5 years.

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