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Axcelis Technologies Inc

ACLS
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86.080USD
+4.590+5.63%
收盘 02/06, 16:00美东报价延迟15分钟
2.67B总市值
20.28市盈率 TTM

Axcelis Technologies Inc

86.080
+4.590+5.63%
盘中分时
1分
30分
1小时
日k
周k
月k
日k

今天

+5.63%

5天

-2.26%

1月

-8.33%

6月

+13.68%

今年开始到现在

+7.14%

1年

+31.50%

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TradingKey Axcelis Technologies Inc股票评分

单位: USD 更新时间: 2026-02-06

操作建议

Axcelis Technologies Inc当前公司基本面数据相对非常健康,最新ESG披露属于行业领先水平。增长潜力很大。当前估值合理,在半导体与设备行业排名39/104位。机构持股占比非常高,近一月多位分析师给出公司评级为持有。最高目标价107.71。中期看,股价处于平稳状态。近一个月,市场表现较差,但公司基本面和技术面得分较高。目前股价在压力位和支撑位之间,可以做区间波段操作。

Axcelis Technologies Inc评分

相关信息

行业排名
39 / 104
全市场排名
143 / 4521
所属行业
半导体与设备

压力支撑

由于公司未披露,未能获取相关数据

多维评测

本期评分
上期评分

公司舆情

过去24小时
热度

过冷
过热
中性

Axcelis Technologies Inc亮点

亮点风险
Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
估值合理
公司最新PB估值2.62,处于3年历史合理位
机构加仓
最新机构持股32.39M股,环比增加0.20%
PRFDX持仓
明星投资者PRFDX持仓,最新持仓市值502.82K

分析师目标

根据 7 位分析师
持有
评级
107.714
目标均价
+32.18%
涨幅空间
数据免责声明:分析师评级与目标价由LSEG提供,仅供参考,不应当作投资建议

Axcelis Technologies Inc新闻

即将为您带来更多新闻,敬请期待。。。

财务指标

每股收益

由于公司未披露,未能获取相关数据

营业总收入

由于公司未披露,未能获取相关数据

Axcelis Technologies Inc简介

Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
公司代码ACLS
公司Axcelis Technologies Inc
CEOLow (Russell J)
网址https://www.axcelis.com/
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