Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
Código de la empresaACLS
Nombre de la empresaAxcelis Technologies Inc
Fecha de salida a bolsaJul 11, 2000
Fundada en1995
Director ejecutivoDr. Russell J. Low, Ph.D.
Número de empleados1524
Tipo de seguridadOrdinary Share
Fin del año fiscalJul 11
Dirección108 Cherry Hill Dr
CiudadBEVERLY
Bolsa de valoresNASDAQ Global Select Consolidated
PaísUnited States of America
Código postal01915
Teléfono19782324001
Sitio Webhttps://www.axcelis.com/
Código de la empresaACLS
Fecha de salida a bolsaJul 11, 2000
Fundada en1995
Un total de
0.00
USD se ha distribuido en dividendos durante los últimos 5 años.

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