Axcelis Technologies, Inc. provides high-productivity solutions for the semiconductor industry. The Company is focused on developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the critical and enabling steps in the IC manufacturing process. Its ion implantation products include high current ion implant, high energy ion implant and medium current ion implant. The Company's Purion H, Purion Dragon, Purion H200, and GSD/E2 Ovation spot beam, high current systems cover all traditional high current requirements as well as those associated with emerging and future devices. Its Purion XE, EXE, and other Purion high energy systems combine its production-proven RF Linac high energy, spot beam technology with the Purion platform wafer handling system. Its medium current ion implant products include its Purion M Si and SiC medium current systems. It also offers its customers aftermarket service and support.
Unternehmens-codeACLS
Name des UnternehmensAxcelis Technologies Inc
IPO-datumJul 11, 2000
Gegründet am1995
CEODr. Russell J. Low, Ph.D.
Anzahl der mitarbeiter1524
WertpapierartOrdinary Share
GeschäftsjahresendeJul 11
Addresse108 Cherry Hill Dr
StadtBEVERLY
BörseNASDAQ Global Select Consolidated
LandUnited States of America
Postleitzahl01915
Telefon19782324001
Websitehttps://www.axcelis.com/
Unternehmens-codeACLS
IPO-datumJul 11, 2000
Gegründet am1995
In den vergangenen 5 Jahren wurden insgesamt
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USD an Dividenden ausgeschüttet.

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